Renderer::StencilAndFill() chooses between two instances based on fill
type (more to come when we add stencil pass). The inverse fill uses
different stencil settings and different geometry (hence why it must be
a distinct renderer, since stencil is part of the pipeline).
Also updates the command buffer asserts and types to support float3
attributes and has the fill bounds render step pre-transform vertices.
This matches the intended plan of device-space control points to
avoid matrix transform uniforms when no other coords are needed.
Makes DepthStencilSettings constexpr so they can be declared constants.
Cq-Include-Trybots: luci.skia.skia.primary:Test-Mac11-Clang-MacMini9.1-GPU-AppleM1-arm64-Release-All-Graphite,Test-Mac11-Clang-MacMini9.1-GPU-AppleM1-arm64-Debug-All-ASAN_Graphite,Build-Mac-Clang-arm64-Release-iOS_Graphite,Build-Mac-Clang-arm64-Release-Graphite,Build-Mac-Clang-arm64-Debug-iOS_Graphite,Build-Mac-Clang-arm64-Debug-Graphite_NoGpu,Build-Mac-Clang-arm64-Debug-Graphite,Build-Mac-Clang-arm64-Debug-ASAN_Graphite
Bug: skia:12703
Change-Id: I5be4151f533e4cc5c560baf96c59193162b48dab
Reviewed-on: https://skia-review.googlesource.com/c/skia/+/484559
Reviewed-by: Greg Daniel <egdaniel@google.com>
Commit-Queue: Michael Ludwig <michaelludwig@google.com>
bdc0bad2e2